Details
Title
Comparison of experimental data and numerical simulation of two-phase flow pattern in vertical minichannelJournal title
Chemical and Process EngineeringYearbook
2012Issue
No 1 MarchAuthors
Keywords
two phase flow ; minichannel ; flow pattern ; numerical simulationDivisions of PAS
Nauki TechniczneCoverage
63-71Publisher
Polish Academy of Sciences Committee of Chemical and Process EngineeringDate
2012Type
Artykuły / ArticlesIdentifier
DOI: 10.2478/v10176-012-0006-1 ; ISSN 0208-6425Source
Chemical and Process Engineering; 2012; No 1 March; 63-71References
Dziubiński M. (2005), Hydrodynamics of two-phase flow mixtures of liquid-gas. ; FLUENT Release 12.1, 2009. <i>Manual</i>, Ansys Inc. ; Ide H. (2005), Experimental research on the correlations of holdup and fractional pressure drop in air-water two-phase flow in capillary rectangular channel, Exp. Therm. Sci, 29, 833, doi.org/10.1016/j.expthermflusci.2005.03.010 ; Mishima K. (1996), Some characteristics of air-water two-phase flow in small diameter vertical tubes, Int. J., Multiphase flow, 22, 703, doi.org/10.1016/0301-9322(96)00010-9 ; Pohorecki R. (2008), A simple mechanism of bubble and slug formation in Taylor flow in microchannels, Chem. Eng. Res. Des, 86, 997, doi.org/10.1016/j.cherd.2008.03.013 ; Qian D. (2006), Numerical study on gas and liquid slugs for Taylor flow in a T-junction microchannel, Chem. Eng. Sci, 61, 7609, doi.org/10.1016/j.ces.2006.08.073 ; Raghvendra G. (2009), On the CFD modelling of Taylor flow in microchannels, Chem. Eng. Sci, 64, 2941, doi.org/10.1016/j.ces.2009.03.018 ; Santos R. (2010), Numerical modeling and experimental investigation of gas-liquid slug formation in a microchannel T-junction, Int. J. Multiphase Flow, 36, 314, doi.org/10.1016/j.ijmultiphaseflow.2009.11.009 ; Sowiński J. (2009), Velocity and gas-void fraction in two-phase liquid-gas flow in narrow mini-channels, Arch. Mech, 61, 29. ; Tomczak Ł. (2007), Application of image analysis to determine two-phase liquid- gas flow parameters in narrow minichannels, Chem. Process Eng, 28, 1134.Editorial Board
Editorial Board
Ali Mesbach, UC Berkeley, USA
Anna Gancarczyk, Institute of Chemical Engineering, Polish Academy of Sciences, Poland
Anna Trusek, Wrocław University of Science and Technology, Poland
Bettina Muster-Slawitsch, AAE Intec, Austria
Daria Camilla Boffito, Polytechnique Montreal, Canada
Donata Konopacka-Łyskawa, Gdańsk University of Technology, Poland
Dorota Antos, Rzeszów University of Technology, Poland
Evgeny Rebrov, University of Warwick, UK
Georgios Stefanidis, National Technical University of Athens, Greece
Ireneusz Grubecki, Bydgoszcz Univeristy of Science and Technology, Poland
Johan Tinge, Fibrant B.V., The Netherlands
Katarzyna Bizon, Cracow University of Technology, Poland
Katarzyna Szymańska, Silesian University of Technology, Poland
Marcin Bizukojć, Łódź University of Technology, Poland
Marek Ochowiak, Poznań University of Technology, Poland
Mirko Skiborowski, Hamburg University of Technology, Germany
Nikola Nikacevic, University of Belgrade, Serbia
Rafał Rakoczy, West Pomeranian University of Technology, Poland
Richard Lakerveld, Hong Kong University of Science and Technology, Hong Kong
Tom van Gerven, KU Leuven, Belgium
Tomasz Sosnowski, Warsaw University of Technology, Poland